Model: NA
Ashing System
The ashing system is available in two types: one designed for wafers and the other for panels.
The wafer-compatible model features a wafer-size-free design, capable of handling a wide range of processes from next-generation wafer processes to wafer-level packaging. It is the most widely adopted device in semiconductor packaging processes.
The panel-compatible model supports panels up to 600mm square, allowing for uniform Descum processing and Ti etching even on large panels.
