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Power Supply
A plasma generation power supply, also known as a deposition power supply, is a device that generates plasma by applying voltage between electrodes. By utilizing this technology, various vacuum processes such as PVD (e.g., sputtering), CVD, etching, and ashing can be performed. These processes enable the formation or removal of films on substrates, thereby creating new added value. This technology is widely applied in many everyday products around us.
RF Power Supply
The "Model:RFS-N" is a 13.56MHz, 0.5kW/1/kW/3kW/5kW output RF power supply for plasma processing. Equipped with a high-efficiency RF amplifier, it is compact and lightweight.
RF Power Supply
The RMG-1303 is a 13.56MHz, 300W RF power supply with built-in output matcher for plasma processes such as RF sputtering and plasma CVD etching. The integration of the matcher and the RF power supply makes it smaller and lighter. It can be controlled from low output, and can be used in a wide range of fields, from R&D applications to mass production equipment.
Pulsed and DC power supply systems
The MFU, which is available as an external unit for DC power supplies, is an MF power supply for use in sputtering of dual cathodes. It is effective not only for metal films but also for reactive deposition. Stable sputtering is achieved without the loss of the anode.
Pulsed and DC power supply systems
The "Model:A2K", which is available as an external unit for DC power supplies, is an abnormal discharge prevention unit that converts a DC output into a pulse output and neutralizes the charge on the target.
Pulsed and DC power supply systems
The Digital "Model:DC" is a DC power supply for sputtering. It is composed of reliable components and circuits. It is a highly reliable power supply that is ideal for plasma loads by reflecting the know-how we have cultivated over many years, including the application of power supplies, in the design.
Pulsed and DC power supply systems
It is designed for plasma generation such as LF power supply, dual cathode sputtering, plasma CVD, etc., and can continuously output rated power at frequencies from 20kHz to 100kHz for plasma loads. Highly reliable and ideal for plasma loads that reflect know-how including power supply applications cultivated over many years in the design
Power supply.
Pulsed and DC power supply systems
The "Model:DC" is a direct current power supply (DC power supply) for sputtering. It is composed of reliable components and circuits. It is a highly reliable power supply that is ideal for plasma loads by reflecting the know-how we have cultivated over many years, including the application of power supplies, in the design.
The "Model:DC PULSE" is a pulsed power supply that is effective in suppressing abnormal discharges that occur in reactive processes.
This power supply reverses the output voltage at a set period and cancels out charge accumulation (charge-up) on the target surface, thereby suppressing abnormal discharge and improving yield and throughput.